Method of manufacturing electron-emitting device and method of manufacturing image display apparatus
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United States of America Patent
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Dec 14, 2010
Grant Date -
Jun 24, 2010
app pub date -
Apr 10, 2009
filing date -
Dec 19, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An electron-emitting device manufacturing method includes a first step of forming a conductive film on an insulating layer having an upper surface and a side surface connected to the upper surface via a corner portion so as to extend from the side surface to the upper surface and cover at least a part of the corner portion, and a second step of etching the conductive film in a film thickness direction. At the first step, the conductive film is formed so that film density of the conductive film on the side surface of the insulating layer becomes the same as or higher than film density of the conductive film on the upper portion of the insulating film.
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