Polyamide substrate having stain resistance, composition and method
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United States of America Patent
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Dec 3, 2002
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N/A
app pub date -
Oct 1, 1999
filing date -
Oct 1, 1999
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Abstract
A combination of a semi-soluble methacrylic polymer and a sulfonated naphthalene condensation product, optionally with a semi-soluble or insoluble ethyl methacrylate polymer of high molecular weight, provides improved resistance to staining by acid colorants of fibrous polyamide substrate.
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