Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

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United States of America Patent

PATENT NO 11584990
APP PUB NO 20230002893A1
SERIAL NO

17367284

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Abstract

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Bottom-fed ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules comprise an outer cylindrical wall and an inner cylindrical wall defining a flow channel in between and a bottom wall having a top surface with a plurality of concentric elongate walls, each wall comprising an opening offset from the opening in adjacent walls defining a gas exchange zone through which a carrier gas flows in contact with the precursor.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Marquardt, David Scottsdale, US 30 1985
Verghese, Mohith Phoenix, US 42 9492
White, Carl Gilbert, US 43 8205

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