Substrate, liquid ejection head, and method of manufacturing substrate
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United States of America Patent
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Apr 11, 2023
Grant Date -
N/A
app pub date -
Jul 16, 2021
filing date -
Jul 30, 2020
priority date (Note) -
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status (Latency Note)
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Abstract
In a substrate, a first flow channel opened in a first surface of a silicon base material having a crystal orientation of <110>, and a second flow channel opened in a second surface of the silicon base material opposite the first surface are formed to communicate with each other. The second flow channel has an opening width narrower than an opening width of the first flow channel, and a groove portion shallower than a depth of the second flow channel is formed close to the opening of the second flow channel in a region that is inside the opening of the first flow channel and outside the opening of the second flow channel in the second surface.
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