Positive photosensitive resin composition, cured film obtained using same, and optical device
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United States of America Patent
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Sep 9, 2014
Grant Date -
Jul 12, 2012
app pub date -
Sep 16, 2010
filing date -
Sep 29, 2009
priority date (Note) -
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Abstract
Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or composite particles of any of the aforementioned compounds and a silicon compound, (c) a naphthoquinonediazide compound and (d) a solvent. The positive photosensitive resin composition is also characterized in that the organosilane oligomer contains a specific organosilane. The positive photosensitive resin composition has achieved excellent sensitivity and resolution without deteriorating high refractive index and high transparency.
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