FINFET transistor having a doped sub fin structure to reduce channel to substrate leakage

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United States of America Patent

PATENT NO 11670682
SERIAL NO

17336565

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Abstract

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An apparatus is described. The apparatus includes a FINFET device having a channel. The channel is composed of a first semiconductor material that is epitaxially grown on a subfin structure beneath the channel. The subfin structure is composed of a second semiconductor material that is different than the first semiconductor material. The subfin structure is epitaxially grown on a substrate composed of a third semiconductor material that is different than the first and second semiconductor materials. The subfin structure has a doped region to substantially impede leakage currents between the channel and the substrate.

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Patent Owner(s)

  • TAHOE RESEARCH, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dewey, Gilbert Hillsboro, US 440 4103
Ghani, Tahir Portland, US 698 6983
Kavalieros, Jack T Portland, US 511 7889
Ma, Sean T Portland, US 71 167
Metz, Matthew V Portland, US 331 5773
Mohapatra, Chandra S Beaverton, US 56 262
Murthy, Anand S Portland, US 309 5590
Rachmady, Willy Beaverton, US 426 5625

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