Gas purification system

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United States of America Patent

PATENT NO 4375450
SERIAL NO

06254558

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A gas purification system has: a first treatment apparatus, which purifies an untreated feed gas, containing toxic ingredients such as HCN gas, H.sub.2 S gas and NH.sub.3 gas, into a primary treated gas by causing the feed gas to contact with an alkaline absorbent liquid; an absorbent-liquid-resuscitation apparatus, which refreshes the absorbent liquid, after absorbing the toxic ingredients, by bubblingly introducing a resuscitation gas; and a second treatment apparatus, which further purifies the primary treated gas into a secondary treated gas by strippingly capturing any possible remnant NH.sub.3 gas still present in the former. The resuscitation gas and the toxic-ingredient-absorbed absorbent liquid are forcibly converged by premix nozzles into combined gas/liquid jets as are injected into the absorbent-liquid-resuscitation apparatus. The primary treated gas and the gas coming from the resuscitation apparatus as its effluent waste are commingled and the resultant mixed gas is then fed into and treated within the second treatment apparatus.

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Patent Owner(s)

  • OSAKA GAS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Katagiri, Katsuo Nara, JP 4 30
Shimazu, Kiyotaka Higashiosaka, JP 2 22

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