Lithographic mask, lithographic apparatus and method

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United States of America Patent

PATENT NO 8974989
APP PUB NO 20130183611A1
SERIAL NO

13743231

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Abstract

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A lithographic mask has a substrate substantially transmissive for radiation of a certain wavelength, the substrate having a radiation absorbing material in an arrangement, the arrangement configured to apply a pattern to a cross-section of a radiation beam of the certain wavelength, wherein the absorbing material has a thickness which is substantially equal to the certain wavelength divided by a refractive index of the absorbing material.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Finders, Jozef Maria Veldhoven, NL 60 966

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