Quality control method of position measurement light source, semiconductor manufacturing apparatus, and method for manufacturing semiconductor device

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United States of America Patent

PATENT NO 11031306
APP PUB NO 20190295902A1
SERIAL NO

16127426

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Abstract

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According to one embodiment, a quality control method of a position measurement light source includes irradiating light of the position measurement light source on a plurality of marks having different heights and measuring a relationship between the height of the mark and an intensity of light reflected by the mark. The quality control method includes identifying a wavelength of the position measurement light source by comparing measurement data acquired by the measuring to reference data of a relationship between the height of the mark and an intensity of reflected light for each of a plurality of wavelengths.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Murakami, Sadatoshi Kanagawa, JP 26 182
Toshima, Miki Kanagawa, JP 4 8

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