Exposure apparatus equipped with interferometer and exposure apparatus using the same
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United States of America Patent
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Sep 6, 2011
Grant Date -
May 15, 2008
app pub date -
Dec 14, 2007
filing date -
Sep 1, 2004
priority date (Note) -
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Abstract
An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system, wherein the measuring apparatus includes an optical element having opposing first and second surfaces, wherein the first surface has a first measurement pattern, and the second surface has a second measurement pattern and is closer to the projection optical system than the first measurement pattern, and wherein the measuring apparatus introduces light into the projection optical system via first and second measurement patterns.
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