Method and system for dry development of a multi-layer mask using sidewall passivation and mask passivation
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United States of America Patent
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Aug 3, 2010
Grant Date -
Oct 11, 2007
app pub date -
Mar 29, 2006
filing date -
Mar 29, 2006
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Abstract
A method and system for the dry development of a multi-layer mask is described. A first passivation gas comprises as an incipient ingredient a hydrocarbon gas, while a second passivation gas comprises as an incipient ingredient an oxygen-containing gas.
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