Control method and plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11764082
APP PUB NO 20210043472A1
SERIAL NO

16978193

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Abstract

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A control method of a plasma processing apparatus including a first electrode and a second electrode includes supplying a bias power to the first electrode, and supplying a negative DC voltage to the second electrode. The negative DC voltage periodically repeats a first state that takes a first voltage value and a second state that takes a second voltage value having an absolute value smaller than the first voltage value. The control method further includes a first control process of applying the first state of the negative DC voltage in a partial time period within each cycle of a signal synchronized with a cycle of a radio frequency of the bias power, or in a partial time period within each cycle of a periodically varying parameter measured in a transmission path of the bias power, and applying the second state continuously with the first state.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dokan, Takashi Miyagi, JP 19 121
Koshimizu, Chishio Miyagi, JP 216 5136
Kubota, Shinji Miyagi, JP 108 973
Maruyama, Koji Miyagi, JP 91 1388
Nagami, Koichi Miyagi, JP 47 669

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