Periodic patterns and technique to control misalignment between two layers

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United States of America Patent

PATENT NO 7656528
APP PUB NO 20070127025A1
SERIAL NO

11673115

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Abstract

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A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

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Patent Owner(s)

  • KLA-TENCOR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abdulhalim, Ibrahim Kfar Manda, IL 41 793
Adel, Mike Zichron Ya'akov, IL 21 598
Faeyrman, Michael Kiryat Motzkin, IL 18 426
Friedmann, Michael Nesher, IL 46 1189

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