Techniques for reducing surface adhesion during demolding in nanoimprint lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11667059
APP PUB NO 20200247016A1
SERIAL NO

16745850

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Disclosed herein are techniques for molding a slanted structure. In some embodiments, a mold for nanoimprint lithography includes a support layer, a polymeric layer on the support layer and including a slanted structure, and an oxide layer on surfaces of the slanted structure. In some embodiments, the oxide layer is conformally deposited on the surfaces of the slanted structure by atomic layer deposition. In some embodiments, the mold further includes an anti-sticking layer on the oxide layer.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • META PLATFORMS TECHNOLOGIES, LLC

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Calafiore, Giuseppe Redmond, US 96 441

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Dec 6, 2026
7.5 Year Payment $3600.00 $1800.00 $900.00 Dec 6, 2030
11.5 Year Payment $7400.00 $3700.00 $1850.00 Dec 6, 2034
Fee Large entity fee small entity fee micro entity fee
Surcharge - 3.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00