Reusable cut mask for multiple layers
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United States of America Patent
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Oct 28, 2014
Grant Date -
Sep 18, 2014
app pub date -
May 14, 2013
filing date -
Mar 15, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
The present disclosure relates to a method of forming a reusable cut mask or trim mask that can be used for multiple design levels, and an associated apparatus. In some embodiments, the method is performed by determining positions of a plurality of mask cuts for a reusable cut mask or a reusable trim mask. Shapes are then routed along a routing path having a plurality of design levels. The routing path intersects one or more of the plurality of mask cuts at positions that form distinct shapes that connect nodes of an integrated chip sharing a same electric network. By routing shapes on a plurality of design levels to intersect one or more of the plurality of mask cuts, the cut masks can be reused between the plurality of levels, therefore decreasing mask costs during fabrication.
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