Ion source, method of operating the same, and ion source system
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United States of America Patent
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Jan 18, 2005
Grant Date -
Nov 27, 2003
app pub date -
May 21, 2003
filing date -
May 24, 2002
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In an ion source, within a support body which supports a plasma production chamber for producing a plasma on the basis of an ion source flange, a cavity is provided ranging from a position near the plasma production chamber to a position near the ion source flange. The cavity serves as a cooling medium passage which introduces a cooling medium to a position near the plasma production chamber to cool the plasma production chamber. The plasma production chamber is cooled at a position very near it by the cooling medium. Therefore, temperature of the plasma production chamber at the time of plasma production is kept at low temperatures.
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