Process for etching mixed metal oxides
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United States of America Patent
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Oct 18, 1994
Grant Date -
N/A
app pub date -
Feb 26, 1993
filing date -
Feb 26, 1993
priority date (Note) -
Expired
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Abstract
An etching process using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstom range may be achieved by this method.
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