Find end point of CLF3 clean by pressure change
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United States of America Patent
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Feb 13, 2001
Grant Date -
N/A
app pub date -
Dec 7, 1998
filing date -
Dec 7, 1998
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Abstract
A method for detecting completion of reaction chamber cleaning, comprising monitoring the pressure within the reaction chamber, calculating and tracking voltage versus time gradient of the pressure within the reaction chamber, recognizing when positive and negative gradients of pressure change have occurred and, based on this recognition, terminating the cleaning process of the reaction chamber.
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