Cleaning agent and cleaning process for harmful gas

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United States of America Patent

PATENT NO 5882615
SERIAL NO

08677978

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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There are disclosed a cleaning agent for removing a fluorine-compound gas such as hydrogen fluoride, fluorine, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride which agent comprises a molded article produced by using strontium hydroxide as a principal component, an organic binding agent as a molding agent and the hydroxide of an alkaline earth metal other than strontium as a molding aid; and a process for cleaning a harmful gas which comprises feeding a harmful gas containing a fluorine-compound gas into a column packed inside with the above cleaning agent to remove the fluorine-compound gas; and exhausting a gas substantially free from the fluorine-compound gas. The above cleaning agent is capable of removing the fluorine-compound gas in high efficiency without causing any danger, thereby making itself well suited to the cleaning of the gases exhausted, for example, from semiconductor manufacturing industries.

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Patent Owner(s)

  • JAPAN PIONICS CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arakawa, Satoshi Hiratsuka, JP 187 2350
Fukuda, Hideki Hiratsuka, JP 100 1757
Otsuka, Kenji Hiratsuka, JP 73 1436

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