Manufacturing method of semiconductor device and substrate processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 12, 2009
Issued Date -
N/A
app pub date -
Jan 21, 2005
filing date -
Jan 21, 2004
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
To provide a manufacturing method of a semiconductor device and a substrate processing apparatus capable of easily controlling a nitrogen concentration distribution in a film containing a metal atom and a silicon atom, and manufacturing a high quality semiconductor device., and performing a nitriding process for the film, wherein the film is formed by changing a silicon concentration at least in two stages in the step of forming a film.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully