Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine
Number of patents in Portfolio can not be more than 2000
United States of America
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Jun 14, 2011
Issued Date -
N/A
app pub date -
Nov 26, 2007
filing date -
Nov 26, 2007
priority date (Note) -
Withdrawn
status (Latency Note)
Importance
Abstract
An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.
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Cited Art Landscape
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