Method and systems for improving focus accuracy in a lithography system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 30, 2006
Issued Date -
N/A
app pub date -
Feb 7, 2005
filing date -
Apr 25, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully