Template and method of manufacturing semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10274822
APP PUB NO 20180164680A1
SERIAL NO

15694585

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A template for patterning processes has a first protrusion portion on a first surface with a first step portion in a first region and a second step portion in a second region. The first step portion includes a plurality of first steps, at least one of which has a first step height and a first step width. The second step portion includes a plurality of second steps, at least one of which has the first step height and the first step width. The template includes a first recess portion on the first surface between the first and second regions on the first protrusion portion. The first recess portion has at least one of a recess depth different from the first step height and a recess width different from the first step width.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Komori, Motofumi Yokohama Kanagawa, JP 4 11
Mitra, Anupam Yokohama Kanagawa, JP 22 27
Takahata, Kazuhiro Yokohama Kanagawa, JP 38 77

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