Positive resist composition and patterning process

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United States of America Patent

PATENT NO 11592745
APP PUB NO 20200241418A1
SERIAL NO

16774057

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Abstract

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A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

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Patent Owner(s)

  • SHIN-ETSU CHEMICAL CO. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatakeyama, Jun Joetsu, JP 649 7264

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