Imprint apparatus, imprinting method, and manufacturing method of article
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 27, 2022
Grant Date -
Oct 1, 2020
app pub date -
Mar 25, 2020
filing date -
Mar 29, 2019
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An imprint apparatus using a mold having a pattern region includes an irradiation unit that irradiates a substrate with irradiation light. The irradiation light has an intensity distribution over a region along a periphery of a shot area of the substrate and being capable of increasing viscosity of an imprint material or of solidifying the imprint material. The imprint apparatus also includes a control unit that sets an imprint condition for forming a pattern of the imprint material so as to reduce at least one of an extrusion of the imprint material from the shot area and an unfilling of the imprint material occurring in the shot area on the basis of results of detecting at least one of the extrusion and the unfilling of the imprint material obtained by detecting the pattern of the imprint material formed on the substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully