Method of reducing plasma-induced damage
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United States of America Patent
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Feb 18, 2003
Grant Date -
N/A
app pub date -
Sep 26, 2000
filing date -
Sep 26, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of reducing plasma-induced damage in a substrate, comprising providing a post-deposition ramp down of a plasma source power used in generating a plasma for substrate processing.
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