Exposure apparatus, exposure method, and method of manufacturing article
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United States of America Patent
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May 23, 2023
Grant Date -
N/A
app pub date -
Oct 13, 2020
filing date -
Oct 18, 2019
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention provides an exposure apparatus that exposes a substrate via an original, including an illumination optical system configured to illuminate the original, and a projection optical system configured to project a pattern of the original onto the substrate, wherein the illumination optical system illuminates the original by illumination light which includes a first portion that enters an incident pupil of the projection optical system and a second portion which enters a region outside the incident pupil, and the first portion and the second portion are separated from each other on an incident pupil plane of the projection optical system.
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