Device for measuring crystal orientation and crystal distortion in polycrystalline materials
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United States of America Patent
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Oct 8, 2002
Grant Date -
N/A
app pub date -
Oct 19, 2000
filing date -
Oct 27, 1999
priority date (Note) -
Expired
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Abstract
A compact device for measuring crystal orientation and crystal distortion in polycrystalline materials is disclosed. The device includes a focused electron beam generator unit, a sample holder, an electron beam detector, a Kossel X-rays detector, an image processor, and a display. The device employs the Kossel X-rays reflection method to measure crystal distortion and to measure crystal orientation in the inner portion of polycrystalline materials, slightly deeper than the shallow surface, while employing the electron beam diffraction method to measure crystal orientation at the shallow surface.
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