Semiconductor device, microphone and methods for forming a semiconductor device

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United States of America Patent

PATENT NO 11352253
APP PUB NO 20210002132A1
SERIAL NO

17024029

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Abstract

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A semiconductor device comprises a structured metal layer. The structured metal layer lies above a semiconductor substrate. In addition, a thickness of the structured metal layer is more than 100 nm. Furthermore, the semiconductor device comprises a covering layer. The covering layer lies adjacent to at least one part of a front side of the structured metal layer and adjacent to a side wall of the structured metal layer. In addition, the covering layer comprises amorphous silicon carbide.

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Patent Owner(s)

  • INFINEON TECHNOLOGIES AG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kahn, Markus Rangersdorf, AT 47 895
Kaiser, Anna-Katharina Regen, DE 2 0
Pirk, Soenke Villach, AT 5 4
Steinbrenner, Juergen Noetsch, AT 35 344
Straeussnigg, Julia-Magdalena Villach, AT 2 0

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