Importance

Loading Importance Indicators...

Abstract

A planarized layer is formed on the substrate, and an opening is formed. A microlens resist layer is formed over the planarized layer, wherein the microlens resist layer has a bigger thickness in the opening than on the planarized layer. A first photoresist layer is formed on the microlens layer. The first photoresist layer has a pattern align to the color filter. A first exposure step is performed at least onto the microlens layer to form a first exposed portion, using the first photoresist layer as a mask, and the first photoresist layer is removed. A second photoresist layer is performed on the microlens resist layer. The second photoresist layer has a pattern align to the opening. A second exposure step is performed at least onto the microlens layer to form a second exposed portion, using the second photoresist layer as a mask, and the second photoresist layer is removed. A positive development step is performed to remove the first exposed portion and the second exposed portion of the microlens resist layer and to form a plurality of microlens blocks align to the color filter. An after-development-exposure step and a curing step are performed so that each of the microlens blocks forms a microlens. The microlens has a substantially rounded semi-circle structure.

Loading the Abstract Image...

First Claim