Method of making active matrix substrate with pixel electrodes of photosensitive conductive material
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United States of America Patent
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Jul 11, 2006
Grant Date -
Aug 5, 2004
app pub date -
Dec 31, 2003
filing date -
Jun 2, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
There is provided an active matrix substrate which enables to shorten a fabrication process of a pixel electrode, improve exposure precision by self alignment, and prevent leakage failures between pixel electrodes. On top of the interlayer insulating film, there are formed pixel electrodes, which are connected to the TFTs through contact holes piercing through the interlayer insulating film. The pixel electrodes are formed by applying on the interlayer insulating film a photosensitive transparent resin such as negative acrylic polymerized resin containing ITO, ATO or ZnO as transparent conductive particles, performing exposure from the back side of the substrate, and conducting development.
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