Light irradiation type heat treatment apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11183403
APP PUB NO 20190088513A1
SERIAL NO

16055293

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A semiconductor wafer held by a susceptor in a chamber is irradiated with halogen light radiated from a plurality of halogen lamps to be heated. A stainless steel block having an opening in a cylindrical shape is provided between the chamber and the halogen lamps. This reduces a distance from a light emitting portion in a light source region in which the plurality of halogen lamps is arranged, throughout the entire circumference of the opening in a cylindrical shape, so that the amount of reflected light from the inner wall surface of the opening toward the peripheral portion of the semiconductor wafer becomes uniform. This causes a uniform increase in illuminance of the peripheral portion of the semiconductor wafer, where temperature tends to decrease, at the time of light irradiation from the halogen lamps, so that in-plane temperature distribution of the semiconductor wafer can be made uniform.

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Patent Owner(s)

  • SCREEN HOLDINGS CO., LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furukawa, Masashi Kyoto, JP 44 96
Ito, Yoshio Kyoto, JP 105 1194

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