Spin drying apparatus
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United States of America Patent
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-
Nov 18, 1986
Grant Date -
N/A
app pub date -
May 16, 1986
filing date -
May 16, 1986
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A spin drying apparatus for drying semiconductor wafers wherein the wafers are contacted only at the edge thereof by a plurality of radially extending arms and wherein means is provided for preventing the generation of turbulent air flow by the fan-like effect of the rotation of the arms during the spin drying step and the recontamination of already cleaned and dried wafer surfaces by contaminants stirred up by the operation of the spin drying apparatus itself.
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