Magnetic enhancement for mechanical confinement of plasma
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United States of America Patent
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Nov 25, 2008
Grant Date -
Jan 13, 2005
app pub date -
Jun 20, 2003
filing date -
Jun 20, 2003
priority date (Note) -
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Abstract
A plasma processing apparatus for processing a substrate is provided. A plasma processing chamber with chamber walls is provided. A substrate support is provided within the chamber walls. At least one confinement ring is provided, where the confinement ring and the substrate support define a plasma volume. A magnetic source for generating a magnetic field for magnetically enhancing physical confinement provided by the at least one confinement ring is provided.
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