Defect inspecting apparatus
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United States of America Patent
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May 19, 2009
Grant Date -
Sep 20, 2007
app pub date -
Mar 14, 2007
filing date -
Mar 14, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
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