Semiconductor device

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United States of America Patent

PATENT NO 11848195
APP PUB NO 20230055668A1
SERIAL NO

17980093

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Abstract

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A semiconductor device is provided. The semiconductor device includes a first semiconductor layer; a second semiconductor layer on the first semiconductor layer; an active region between the second semiconductor layer and the first semiconductor layer; an electron blocking structure between the active region and the second semiconductor layer; a first nitride semiconductor layer between the active region and the electron blocking structure, and including indium and aluminum elements; and a second nitride semiconductor layer between the electron blocking structure and the second semiconductor layer, including indium element and devoid of gallium element; wherein the first nitride semiconductor layer has a first indium content, the second nitride semiconductor layer has a second indium content, and the first indium content is greater than the second indium content.

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Patent Owner(s)

Patent OwnerAddress
EPISTAR CORPORATION5 LI-HSIN 5TH RD HSINCHU SCIENCE PARK HSINCHU 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lai, Huan-Yu Hsinchu, TW 4 0
Peng, Li-Chi Hsinchu, TW 5 0

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