Thermal chamber with improved thermal uniformity

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11978646
APP PUB NO 20180337075A1
SERIAL NO

15982785

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Abstract

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Embodiments of the disclosure generally relate to a semiconductor processing chamber. In one embodiment, semiconductor processing chamber is disclosed and includes a chamber body having a bottom and a sidewall defining an interior volume, the sidewall having a substrate transfer port formed therein, and one or more absorber bodies positioned in the interior volume in a position opposite of the substrate transfer port.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chan, Kong Lung Samuel Newark, US 5 25
Chen, Jau-Jiun San Jose, US 2 6
Iu, Dongming Union City, US 23 72
Mayur, Abhilash J Salinas, US 89 6476
Neville, Elizabeth Palo Alto, US 7 0
Pham, Gia San Jose, US 3 8
Rao, Preetham Bangalore, IN 13 370
Shah, Kartik Saratoga, US 78 990
Spuller, Matthew Belmont, US 15 50
Tam, Norman L Cupertino, US 26 76

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