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United States of America Patent

PATENT NO 7911499
APP PUB NO 20100149345A1
SERIAL NO

11919675

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A sample analyzing apparatus includes: an irradiation system which irradiates a charged particle onto a sample having a concave portion partially on a surface thereof; a light condensing reflecting mirror which condenses luminescence obtained from the surface based on the irradiation of the charged particle; a light detector which detects the luminescence guided to the light condensing reflecting mirror; a charged particle detector which detects the charged particle reflected from the surface of the sample as a reflection charged particle; and a signal processor which controls the irradiation system to irradiate the charged particle intermittently, which obtains a shape of the sample on the basis of a detection signal outputted from the charged particle detector, and which identifies a material of the sample on the basis of an attenuation characteristic of a detection signal outputted from the light detector in a period from a time point in which the intermittent irradiation of the charged particle by the irradiation system is ended to a time point in which the intermittent irradiation of the charged particle by the irradiation system is started.

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Patent Owner(s)

  • RICOH COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Tetsuya Inzai, JP 49 1141

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