Wafer handling robot with radial gas curtain and/or interior volume control

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11833662
APP PUB NO 20230074285A1
SERIAL NO

17802137

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A collar may be provided having an aperture through it through which the turret of a wafer handling robot may be extended or retracted. The collar may have one or more radial gas passages. Gas directed inwards towards the turret from the radial passage(s) may turn downward when it strikes the turret. A bellows may be optionally affixed to the bottom of the turret and to the bottom of the base such that the volume of the base occupied by the turret and the bellows remains generally fixed regardless of the degree to which the turret is extended from the base.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blank, Richard M San Jose, US 23 345
Ditmore, Charles N Oakland, US 1 0

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