Optical arrangement for EUV lithography

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11372335
APP PUB NO 20210003926A1
SERIAL NO

17026925

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Abstract

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An optical arrangement for EUV lithography, including: at least one component (23) having a main body (32) with at least one surface region (30) which is exposed to activated hydrogen (H+, H*) during operation of the optical arrangement. The main body (32) contains at least one material which forms at least one volatile hydride upon contact of the surface region (30) with the activated hydrogen (H+, H*). At the surface region, noble metal ions (38) are implanted into the main body (32) in order to prevent the formation of the volatile hydride.

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Patent Owner(s)

  • CARL ZEISS SMT GMBH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gonchar, Anastasia Ulm, DE 6 0

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