Transistor devices with source/drain regions comprising an interface layer that comprises a non-semiconductor material

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11264499
APP PUB NO 20210083111A1
SERIAL NO

16571798

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Abstract

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One illustrative transistor device disclosed herein includes a gate structure positioned above a semiconductor substrate and a source region and a drain region, each of which comprise an epi cavity with a bottom surface and a side surface. The transistor further includes an interface layer positioned on at least one of the side surface and the bottom surface of the epi cavity in each of the source/drain regions, wherein the interface layer comprises a non-semiconductor material and an epi semiconductor material positioned on at least an upper surface of the interface layer in the epi cavity in each of the source region and the drain region.

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Patent Owner(s)

  • GLOBALFOUNDRIES U.S. INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ellis-Monaghan, John Grand Isle, US 12 109
Jain, Vibhor Essex Junction, US 188 998
Pekarik, John J Underhill, US 97 395
Shank, Steven M Jericho, US 217 840
Stamper, Anthony K Burlington, US 613 6578

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