Area selective carbon-based film deposition

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United States of America Patent

PATENT NO 11972940
APP PUB NO 20230335391A1
SERIAL NO

17722648

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Abstract

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Methods of selectively depositing a carbon-containing layer are described. Exemplary processing methods may include flowing a first precursor over a substrate comprising a metal surface and a non-metal surface to form a first portion of an initial carbon-containing film on the metal surface. The methods may include removing a first precursor effluent from the substrate. A second precursor may then be flowed over the substrate to react with the first portion of the initial carbon-containing layer. The methods may include removing a second precursor effluent from the substrate. The methods may include pre-treating the metal surface of the substrate to form a metal oxide surface on the metal surface.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bhuyan, Bhaskar Jyoti San Jose, US 80 398
Mallick, Abhijit Basu Sunnyvale, US 249 10305
Saly, Mark Santa Clara, US 110 1206
Shen, Zeqing San Jose, US 22 1
Singha, Roy Susmit Campbell, US 35 17
Sudijono, John Singapore, SG 60 452
Tang, Jiecong Singapore, SG 10 5
Wang, Xinke Singapore, SG 9 12

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