PHOTORESIST COMPOSITION AND MANUFACTURING METHOD OF THIN FILM TRANSISTOR ARRAY PANEL USING THE SAME

Korea, Republic of Patent

APP PUB NO KR-20140015869-A
SERIAL NO

20120081691

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Abstract

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Provided is a positive photoresist composition. The positive photoresist composition according to one embodiment of the present invention includes a novolak resin, a photosensitive compound, a melamine crosslinking agent, and a solvent. The photosensitive compound includes 2,1,5-diazonaphthoquinone-sulfonate. [Reference numerals] (AA) Start; (BB) End; (S10) Step for forming a pattern member material layer on a substrate; (S20) Step for forming a phone register on the pattern member material layer; (S30) Step for exposing the light to the photo register by using a digital light exposing device; (S40) Step for forming a photo resist pattern by developing the exposed photo resist; (S50) Step for patterning the pattern member material layer as the photo resist pattern acts as a mask

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTDKR1 SAMSUNG-RO GIHEUNG-GU YONGIN-SI GYEONGGI-DO 17113

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Inventor(s)

Inventor Name Address
LEE SANG HYUN 07793 서울특별시 강서구 마곡동로 110 SEOUL 07793
KIM CHANG HOON SUWON-SI
LEE HI KUK YONGIN-SI
CHANG JAE HYUK SEONGNAM-SI
LEE KI BEOM INCHEON 22657
SIM JUN HO YONGIN-SI
SEO KAB JONG 17113 YONGIN-SI

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