Enhanced illuminator for use in photolithographic systems
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United States of America Patent
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Sep 14, 2010
Grant Date -
N/A
app pub date -
May 12, 2006
filing date -
Apr 11, 2003
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Abstract
Methods and apparatus for enabling both isolated and dense patterns to be accurately patterned onto a wafer are disclosed. According to one aspect of the present invention, an illumination system that is suitable for use as a part of a projection tool includes an illumination source and an illuminator aperture. The illuminator aperture has a center point and an outer edge, and also includes a first pole and a second pole. The first pole is defined substantially about the center point, and the second pole is defined substantially between the first pole and the outer edge of the first pole. The illumination source is arranged to provide a beam to the illuminator aperture.
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