Container containing cobalt carbonyl complex and cobalt carbonyl complex composition

Taiwan, Republic of China Patent

APP PUB NO TW-201030171-A
SERIAL NO

98140613

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Abstract

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Disclosed is a container containing a cobalt carbonyl complex, wherein a cobalt carbonyl complex and a gas that contains carbon monoxide are contained. Also disclosed is a cobalt carbonyl complex composition containing a cobalt carbonyl complex and a solvent, wherein the concentration of carbon monoxide dissolved in the solvent is 0.001-1% by weight. The cobalt carbonyl complex contained in the container or the composition can maintain the sublimation properties thereof for a long time without being converted into a stable complex. Consequently, when a cobalt film is formed by chemical vapor deposition using the cobalt carbonyl complex, a good cobalt film can be formed by simple processes. In addition, the production cost of the cobalt film can be suppressed due to high utilization efficiency of the precursor.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPJPTOKYO JAPAN EAST HARBOUR BRIDGE 2 ORDERS 9 TIMES TOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address
NISHIMURA HIDEKI KYOTO-SHI KYOTO 605-0995
MATSUKI YASUO TOKYO 105-8640
SUMIYA KOUJI TSUCHIURA CITY IBARAKI

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