CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

Taiwan, Republic of China Patent

APP PUB NO TW-202502706-A
SERIAL NO

113115879

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Abstract

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A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and a fluorocarboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.

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Patent Owner(s)

Patent OwnerAddress
SHINETSU CHEMICAL COJP

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Inventor(s)

Inventor Name Address
WATANABE SATOSHI TOKYO 136-0075
FUKUSHIMA MASAHIRO JOETSU-SHI
MASUNAGA KEIICHI JOETSU-SHI
KOTAKE MASAAKI JOETSU-SHI
MATSUZAWA YUTA JOETSU-SHI

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