Submicron particle removal from gas streams
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United States of America Patent
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Jul 28, 2020
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N/A
app pub date -
Sep 6, 2019
filing date -
May 9, 2016
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Abstract
Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
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