Film-forming method for forming metal oxide on substrate surface
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United States of America Patent
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Issued Date -
Sep 30, 2004
app pub date -
Mar 25, 2004
filing date -
Mar 26, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A film-forming method includes the steps of introducing oxygen radicals and an organic raw material gas containing a metal element into a vacuum container, and reacting the organic raw material gas with the oxygen radicals, thereby forming a metal oxide film on a surface of a substrate disposed in the vacuum container.
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