COM/IPHONE METHOD OF MAKING SUPEROLEOPHOBIC RE-ENTRANT RESIST STRUCTURES
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United States of America Patent
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Aug 8, 2014
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Jul 16, 2012
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Abstract
A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.
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