Method for deposition of amorphous hard carbon films
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United States of America Patent
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Apr 1, 1997
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N/A
app pub date -
Jun 7, 1995
filing date -
Jun 11, 1993
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Expired
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Abstract
A method for deposition of an amorphous hard carbon film containing silicon and nitrogen on a substrate wherein a carbon source, a silicon source and a nitrogen source are introduced in a deposition chamber in which the substrate are placed to deposit the film on said substrate.
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